Photoconductivity and density of states in 'microstructural' amorphous silicon

Materials Research Society Symposium - Proceedings

Volumn 467, Issue , 1997, Pages 239-244

  Budaguan, B G ^a   Aivazov, A A ^a   Radosel'sky, A G ^a   Popov, A A ^a  

^a NATIONAL RESEARCH UNIVERSITY OF ELECTRONIC TECHNOLOGY   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; DIFFRACTION; ELECTRONIC DENSITY OF STATES; ELECTRONIC PROPERTIES; INFRARED SPECTROSCOPY; MATHEMATICAL MODELS; PHOTOCONDUCTIVITY; PLASMA APPLICATIONS;

HYDROGENATED AMORPHOUS FILMS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RECOMBINATION KINETICS;

AMORPHOUS FILMS;

EID: 0031332817     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-467-239     Document Type: Conference Paper

References (6)