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Volumn 51, Issue 12, 1997, Pages 1769-1780

Characteristics of the secondary plasma induced by focusing a 10-mJ XeCl laser pulse at low pressures

Author keywords

10 mJ XeCl laser; Gas molecules; Low pressure plasma; Spectrochemical application; Ultrafast atoms

Indexed keywords

ATOMS; COPPER; EXCIMER LASERS; LASER ABLATION; MOLECULAR DYNAMICS; PULSED LASER APPLICATIONS; SHOCK WAVES; ULTRAFAST PHENOMENA;

EID: 0031331642     PISSN: 00037028     EISSN: None     Source Type: Journal    
DOI: 10.1366/0003702971939631     Document Type: Article
Times cited : (31)

References (32)
  • 2
    • 0002524839 scopus 로고
    • N. Omenetto, Ed. Wiley, New York
    • K. Laqua, in Analytical Laser Spectroscopy, N. Omenetto, Ed. (Wiley, New York, 1979), pp. 47-118.
    • (1979) Analytical Laser Spectroscopy , pp. 47-118
    • Laqua, K.1
  • 29
    • 6144227194 scopus 로고
    • D. B. Chrisey and G. K. Hubler, Eds. John Wiley and Sons, New York, Chap. 5
    • D. B. Geohegan, in Pulsed Laser Deposition of Thin Films, D. B. Chrisey and G. K. Hubler, Eds. (John Wiley and Sons, New York, 1994), Chap. 5.
    • (1994) Pulsed Laser Deposition of Thin Films
    • Geohegan, D.B.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.