X-ray reflectivity and mechanical stress in W/Si multilayers deposited on thin substrates of glass, epoxy replicated aluminum foil, and Si wafer

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3113, Issue , 1997, Pages 469-475

  Platonov, Yuriy Ya ^a   Broadway, David ^a   DeGroot, Brian ^a   Mao, Peter ^a   Harrison, Fiona ^a   Gutman, George ^a   Rodriguez, Jim ^a  

^a Osmic Inc   (United States)

Author keywords

Epoxy gold replicated foil; Interfacial roughness; Magnetron sputtering deposition; Mechanical stress; Multilayer structure; Thermal annealing; Thin films; Thin glass; Thin substrates; X ray reflectivity; X rays

Indexed keywords

ALUMINUM FOIL; ANNEALING; INTERFACES (MATERIALS); MAGNETRON SPUTTERING; MULTILAYERS; SILICON WAFERS; STRESS ANALYSIS; SURFACE ROUGHNESS; THIN FILMS; X RAY OPTICS;

X RAY REFLECTIVITY;

LIGHT REFLECTION;

EID: 0031305225     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.278878     Document Type: Conference Paper

References (2)

1. Stress, microstructure, and thermal behavior in Mo/Si X-ray multilayers
2. Determination of layered synthetic microstructure parameters