Exposure tool purchase decisions: Evaluation techniques and common pitfalls

Solid State Technology

Volumn 40, Issue 12, 1997, Pages 97-107

  Zavecz, Terrence E ^a,b  

^a TEA Systems Corp   (United States)

^b LEHIGH UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DECISION MAKING; INDUSTRIAL ECONOMICS; PRODUCTION CONTROL; SILICON WAFERS;

EXPOSURE TOOLS;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0031295881     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (3)

1. M. Dusa et al., "Photolithographic Lens Characterization of Critical Dimension Variation Using Empirical Focal Plane Modeling," SPIE, Vol. 3051-26, 1997.
2. M. Dusa et al., "Comprehensive Focus-Overlay-CD Correlation to Identify Photolithographic Performance," SPIE, Vol. 2726-29, 1996.
3. I. Fink et al., "Overlay Sample Plan Optimization for the Detection of Higher-Order Contributions to Misalignment," SPIE, Vol. 2196, pp. 389-399, 1994.