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Volumn 44, Issue 11, 1997, Pages 1896-1902

An analytical drain current model for submicrometer and deep submicrometer MOSFET's

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC CURRENTS; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICE MODELS;

EID: 0031276909     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/16.641358     Document Type: Article
Times cited : (9)

References (17)
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  • 4
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    • Stewart, R.A.1    Churchill, J.N.2
  • 5
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    • "Steadystate and transient analysis of submicron devices using energy balance and simplified hydrodynamic models,"
    • vol. 42, p. 702, 1994.
    • Y. Apanovich, E. Lyumkis, B. Polsky, A. Shur, and P. Blakey, "Steadystate and transient analysis of submicron devices using energy balance and simplified hydrodynamic models," IEEE Trans. Electron Devices, vol. 42, p. 702, 1994.
    • IEEE Trans. Electron Devices
    • Apanovich, Y.1    Lyumkis, E.2    Polsky, B.3    Shur, A.4    Blakey, P.5
  • 6
    • 0028195295 scopus 로고    scopus 로고
    • "Concise analytical model for deep submicron n-channel metal-oxide-semiconductor devices with consideration of energy transport,"
    • vol. 33, p. 228, 1994.
    • S.-Y. Ma and J. B. Kuo, "Concise analytical model for deep submicron n-channel metal-oxide-semiconductor devices with consideration of energy transport," Jpn. J. Appl. Phys., vol. 33, p. 228, 1994.
    • Jpn. J. Appl. Phys.
    • Ma, S.-Y.1    Kuo, J.B.2
  • 7
    • 0029305346 scopus 로고    scopus 로고
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    • vol. 42, p. 864, 1995.
    • J.-H. Sim, "An analytical deep submicron MOS device model considering velocity overshoot behavior using energy balance equation," IEEE Trans. Electron Devices, vol. 42, p. 864, 1995.
    • IEEE Trans. Electron Devices
    • Sim, J.-H.1
  • 9
    • 0029734530 scopus 로고    scopus 로고
    • "Modeling of hot-carrierstressed characteristics of nMOSFET's,"
    • vol. 39, p. 75, 1996.
    • Y.-S. Chen, T.-H. Tang, and S.-L. Jang, "Modeling of hot-carrierstressed characteristics of nMOSFET's," Solid-St. Electron., vol. 39, p. 75, 1996.
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    • Chen, Y.-S.1    Tang, T.-H.2    Jang, S.-L.3
  • 11
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    • "Threshold voltage modeling and the subthreshold region of operation of short-channel MOSFET's,"
    • vol. 40, p. 137, 1993.
    • T. A. Fjeldly and M. Shur, "Threshold voltage modeling and the subthreshold region of operation of short-channel MOSFET's," IEEE Trans. Electron Devices, vol. 40, p. 137, 1993.
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  • 12
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    • vol. 11, p. 228, 1992.
    • T. Sakurai, B. Lin, and A. R. Newton, "Fast simulated diffusion: An optimization algorithm for multiminimum problems and its application to MOSFET model parameter extraction," IEEE Trans. Computer-Aided Design, vol. 11, p. 228, 1992.
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    • Sakurai, T.1    Lin, B.2    Newton, A.R.3
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.