Argon assisted plasma chemical vapour deposition of amorphous silicon carbide films

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 36, Issue 11 PART A, 1997, Pages

  Partha, Chaudhuri ^a   Kumar, Das Ujjwal ^a  

^a DEPARTMENT OF MATERIALS SCIENCE   (India)

Author keywords

Argon assisted plasma CVD; IR study; Optical properties; Reaction kinetics; Silicon carbide thin films

Indexed keywords

ARGON; CHEMICAL VAPOR DEPOSITION; COMPOSITION EFFECTS; HYDROGEN; METHANE; OPTICAL PROPERTIES; PLASMA APPLICATIONS; REACTION KINETICS; SEMICONDUCTING FILMS; SILANES; SILICON CARBIDE; THIN FILMS;

PLASMA CHEMICAL VAPOR DEPOSITION;

AMORPHOUS FILMS;

EID: 0031276014     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.l1426     Document Type: Article

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