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Volumn 37-38, Issue , 1997, Pages 427-432

Control of PVD TiN thickness measurements

Author keywords

Diffusion barrier; Ellipsometry; Resistivity; Titanium nitride; Uniformity

Indexed keywords

COMPOSITION EFFECTS; ELECTRIC CONDUCTIVITY MEASUREMENT; ELLIPSOMETRY; THICKNESS MEASUREMENT; TITANIUM NITRIDE; VAPOR DEPOSITION; VLSI CIRCUITS;

EID: 0031275068     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(97)00142-1     Document Type: Article
Times cited : (3)

References (3)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.