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Volumn 37-38, Issue , 1997, Pages 427-432
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Control of PVD TiN thickness measurements
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Author keywords
Diffusion barrier; Ellipsometry; Resistivity; Titanium nitride; Uniformity
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Indexed keywords
COMPOSITION EFFECTS;
ELECTRIC CONDUCTIVITY MEASUREMENT;
ELLIPSOMETRY;
THICKNESS MEASUREMENT;
TITANIUM NITRIDE;
VAPOR DEPOSITION;
VLSI CIRCUITS;
DIFFUSION BARRIERS;
MULTIPLE ANGLES OF INCIDENCE (MAI) ELLIPSOMETRY;
PHYSICAL VAPOR DEPOSITION (PVD);
PROFILOMETRY MEASUREMENTS;
INTEGRATED CIRCUIT MANUFACTURE;
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EID: 0031275068
PISSN: 01679317
EISSN: None
Source Type: Journal
DOI: 10.1016/S0167-9317(97)00142-1 Document Type: Article |
Times cited : (3)
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References (3)
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