Contact angle and atomic force microscopy study of reactions of n-alkyltrichlorosilanes with muscovite micas exposed to water vapor plasmas with various power densities

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 11, 1997, Pages 6915-6921

  Nakagawa, Tohru ^a   Soga, Mamoru ^a  

^a PANASONIC CORPORATION   (Japan)

Author keywords

Alkyltrichlorosilane; Atomic force microscopy; Contact angle measurements; Molecular electric device; Self assembled monolayers; Water vapor plasma

Indexed keywords

ADSORPTION; ATOMIC FORCE MICROSCOPY; CONDENSATION; CONTACT ANGLE; HYDRATION; HYDROLYSIS; MICA; MOLECULAR STRUCTURE; PLASMAS; POLYMERIZATION; SILANES; SURFACE STRUCTURE;

ALKYLTRICHLOROSILANE; MOLECULAR ELECTRIC DEVICES; SELF ASSEMBLED MONOLAYERS;

MONOLAYERS;

EID: 0031274127     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.6915     Document Type: Article

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