In situ X-ray absorption fine structure and optical reflectance studies of electrodeposited nickel hydrous oxide films in alkaline electrolytes

Canadian Journal of Chemistry

Volumn 75, Issue 11, 1997, Pages 1721-1729

  Hu, Yining ^a   Bae, In Tae ^a   Mo, Yibo ^a   Antonio, Mark R ^b   Scherson, Daniel A ^a  

^a CASE WESTERN RESERVE UNIVERSITY   (United States)

^b ARGONNE NATIONAL LABORATORY   (United States)

Author keywords

EXAFS; In situ measurements; Nickel oxide; Reflectance spectroscopy

Indexed keywords

ELECTRIC CHARGE; ELECTROCHEMISTRY; ELECTRODEPOSITION; ELECTROLYTES; ELECTRON ENERGY LEVELS; FILMS; NICKEL COMPOUNDS; OXIDATION; SPECTROSCOPY;

ALKALINE ELECTROLYTE; ANODIC CHARGE; IN SITU MEASUREMENT; NICKEL HYDROUS OXIDE; REFLECTANCE SPECTROSCOPY; X RAY ABSORPTION FINE STRUCTURE SPECTROSCOPY;

ELECTROCHEMICAL ELECTRODES;

EID: 0031273307     PISSN: 00084042     EISSN: None     Source Type: Journal    
DOI: 10.1139/v97-205     Document Type: Article

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