Modeling of a plasma processing machine for semiconductor wafer etching using energy-functions-based neural networks

IEEE Transactions on Control Systems Technology

Volumn 5, Issue 6, 1997, Pages 598-613

  Salam, Fathi M ^a,b   Piwek, Christian ^b   Erten, Gamze ^a,c   Grotjohn, Timothy ^a,b   Asmussen, Jes ^a,b  

^a IEEE   (United States)

^b Michigan State University   (United States)

^c IC Tech Inc   (United States)

Author keywords

Adaptive systems; Modeling neural networks; Nonlinear systems; Plasma materials processing applications; Semiconductor process modeling

Indexed keywords

ETCHING; NEURAL NETWORKS; NONLINEAR SYSTEMS; PLASMA APPLICATIONS; PLASMAS; SEMICONDUCTOR DEVICE MANUFACTURE;

MODELING;

ADAPTIVE CONTROL SYSTEMS;

EID: 0031273199     PISSN: 10636536     EISSN: None     Source Type: Journal    
DOI: 10.1109/87.641404     Document Type: Article

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