Physical properties of CoFe/IrMn spin-valves prepared using ion beam sputtering with an Xe-H2 mixture gas

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 11, 1997, Pages 6746-6748

  Umemoto, Takashi ^a   Maeda, Atsushi ^a   Takahashi, Seiichirou ^a   Tanuma, Toshio ^a   Kume, Minoru ^a  

^a SANYO ELECTRIC CO LTD   (Japan)

Author keywords

H2; Ion beam sputtering; Magnetoresistance; Spin valve; Xe

Indexed keywords

COBALT ALLOYS; COERCIVE FORCE; FILM PREPARATION; HYDROGEN; ION BEAMS; IRIDIUM ALLOYS; MAGNETIC PROPERTIES; MAGNETORESISTANCE; METALLIC FILMS; SPUTTER DEPOSITION; TANTALUM; XENON;

SPIN VALVES;

MAGNETIC FILMS;

EID: 0031272962     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.6746     Document Type: Article

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