Crack velocities during dynamic fracture of glass and single crystalline silicon

Physica Status Solidi (A) Applied Research

Volumn 164, Issue 1, 1997, Pages

  Cramer, T ^a   Wanner, A ^b   Gumbsch, P ^a  

^a MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS   (Germany)

^b UNIVERSITY OF STUTTGART   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CONDUCTIVE FILMS; COPPER; DEPOSITION; ELECTRIC RESISTANCE MEASUREMENT; FRACTURE MECHANICS; GLASS; SEMICONDUCTING SILICON; SINGLE CRYSTALS; VELOCITY MEASUREMENT;

CRACK VELOCITY;

CRACK PROPAGATION;

EID: 0031272833     PISSN: 00318965     EISSN: None     Source Type: Journal    
DOI: 10.1002/1521-396x(199711)164:13.0.co;2-k     Document Type: Article

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