Ion desorption processes following core-level excitation of substrate and adsorbate

Surface Science

Volumn 391, Issue 1-3, 1997, Pages 278-286

  Chen, J M ^a   Yang, S C ^b   Liu, Y C ^b  

^a NATIONAL SYNCHROTRON RADIATION RESEARCH CENTER   (Taiwan)

^b NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

Auger initiated desorption; Photon stimulated ion desorption; Total electron yield; X ray induced electron stimulated desorption

Indexed keywords

ADSORPTION; CHLORINE; DISSOCIATION; ELECTRON ENERGY LEVELS; HYDROGEN; IONS; PHOTOCHEMICAL REACTIONS; PHOTONS; SEMICONDUCTING SILICON;

PHOTON STIMULATED ION DESORPTION (PSID); X RAY INDUCED ELECTRON STIMULATED DESORPTION (XESD);

DESORPTION;

EID: 0031272605     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(97)00497-4     Document Type: Article

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