Formation and thermal stability of gels in the SiO2-TiO2-ZrO2 system

Journal of the Ceramic Society of Japan

Volumn 105, Issue 11, 1997, Pages 940-946

  Wannagon, Anucha ^a   Mishima, Naofumi ^a   Wakasugi, Takashi ^a   Ota, Rikuo ^a   Fukunaga, Jiro ^a  

^a KYOTO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Amorphous forming ability; Crystallization temperature; Gel region; SiO2 TiO2 ZrO2 gel; Thermal stability

Indexed keywords

AMORPHOUS MATERIALS; CRYSTALLIZATION; DIFFERENTIAL THERMAL ANALYSIS; SILICON COMPOUNDS; SOLUTIONS; THERMAL EFFECTS; THERMODYNAMIC STABILITY; X RAY DIFFRACTION ANALYSIS;

CRYSTALLIZATION PEAK TEMPERATURES;

GELS;

EID: 0031272049     PISSN: 09145400     EISSN: None     Source Type: Journal    
DOI: 10.2109/jcersj.105.940     Document Type: Article

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