The analysis of trace impurities in nitrogen gas by high pressure ionization mass spectrometry

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 11, 1997, Pages 6999-7003

  Ishihara, Yoshio ^a   Umehara, Hitomi ^a   Nishina, Akira ^a   Kimijima, Tetsuya ^a  

^a TAIYO NIPPON SANSO CORPORATION   (Japan)

Author keywords

Atmospheric pressure ionization mass spectrometry; Carbon dioxide; High pressure ionization mass spectrometry; Ion molecule reaction; Moisture; Nitrogen gas; Oxygen; Rate constant; Trace impurity monitor

Indexed keywords

CARBON DIOXIDE; IMPURITIES; IONIZATION OF GASES; MOISTURE DETERMINATION; NITROGEN; OXYGEN; REACTION KINETICS; SEMICONDUCTOR DEVICE MANUFACTURE; TRACE ANALYSIS; ULSI CIRCUITS;

HIGH PRESSURE IONIZATION MASS SPECTROMETRY (HPIMS);

MASS SPECTROMETRY;

EID: 0031271222     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.6999     Document Type: Article

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