Obtaining holographic diffraction gratings on light-sensitive layers of chalcogenide glasses by dry etching

Journal of Optical Technology (A Translation of Opticheskii Zhurnal)

Volumn 64, Issue 11, 1997, Pages 1008-1012

  Gerke, R R ^a   Dubrovina, T G ^a   Dmitrikov, P A ^b   Mikhailov M D ^c  

^a VAVILOV STATE OPTICAL INSTITUTE   (Russian Federation)

^b Khologreît Co   (Russian Federation)

^c Corning Sci Ctr in St Petersburg ^*  (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTION GRATINGS; DRY ETCHING; EFFICIENCY; GLASS; PHOTORESISTS; PHOTOSENSITIVITY;

CHALCOGENIDE GLASS;

HOLOGRAPHY;

EID: 0031270753     PISSN: 10709762     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (14)

1. I. Yu. Yusupov, M. D. Mikhailov, R. R. Gerke et al., "Investigation of arsenic sulfide films for relief-phase holograms," Proc. SPIE 1238, 240 (1991).
2. R. R. Gerke, S. N. Koreshev, G. B. Semenov, and V. V. Smirnov, "Hologram optics at S. I. Vavilov State Optical Institute," Opt. Zh. 61, No. 1, 26 (1994) [J. Opt. Technol. 61, 20 (1994)].
3. R. R. Gerke, S. N. Koreshev, G. B. Semenov, and V. V. Smirnov, "Hologram optics at S. I. Vavilov State Optical Institute," Opt. Zh. 61, No. 1, 26 (1994) [J. Opt. Technol. 61, 20 (1994)].
4. Z. U. Borisova, Chalcogenide Semiconductor Glasses (Izd. Leningr. Gos. Univ., Leningrad, 1983).
5. R. R. Gerke, S. B. Mamedov, M. D. Mikhaǐlov et al., "The properties of holographic gratings on films of arsenic sulfide," in Advances in Scientific Photography, Vol. 26, Fundamental Phenomena, Photochemical and Photophysical Processes in Photochromic and Holographic Recording (Nauka, Moscow, 1990), pp. 52-55.
6. M. D. Bal'makov, M. D. Mikhaǐlov, and I. M. Pecheritsyn, "Production and properties of amorphous films of the As-Te system," Prib. Tekh. Éksp. No. 5, 193 (1981).
7. P. J. S. Ewen, A. Zakery, A. P. Firth et al., "Optical monitoring of photodissolution kinetics in amorphous As-S films," Phil. Mag. B 57, 1 (1988).
8. A. Yoshikawa, O. Ochio, and Y. Mizushima, "Dry development of Se-Ge inorganic resist," Appl. Phys. Lett. 32, 107 (1980).
9. M. T. Kostyshin, E. V. Mikhaǐlovskaya, and P. F. Romanenko, "The photographic sensitivity of thin semiconductor layers on metallic substrates," Fiz. Tverd. Tela 8, 571 (1966) [Phys. Solid State 8, 451 (1966)].
10. M. T. Kostyshin, E. V. Mikhaǐlovskaya, and P. F. Romanenko, "The photographic sensitivity of thin semiconductor layers on metallic substrates," Fiz. Tverd. Tela 8, 571 (1966) [Phys. Solid State 8, 451 (1966)].
11. F. G. Hugget and H. W. Lehman, "The germanium selenide/polymer bilevel photoresist system-a review," J. Electron. Mater. 14, 205 (1985).
12. Y. Utsugi, A. Yoshikava, and T. Katayama, "An inorganic resist technology and its applications to LSI fabrication processes," Microelectr. Eng. 2, 281 (1984).
13. R. Kunzke and G. Liebman, "Herstellung von Beugungsgittern aus photodotierten, amorphen Chalcogenidschichten," J. Inform. Rec. Mater. 14, 395 (1986).
14. 4 inorganic photoresists," J. Vac. Sci. Technol. A 3, 1849 (1985).