SCOPUS 정보 검색 플랫폼

Journal of Non-Crystalline Solids

Volumn 220, Issue 2-3, 1997, Pages 261-266

RF plasma treatment of porous silicon

(2) Bedikjan, L a Danesh, P b

a Central Laboratory of Applied Physics Bulgarian Academy of Sciences (Bulgaria)

b INSTITUTE OF SOLID STATE PHYSICS (Bulgaria)

Author keywords

[No Author keywords available]

Indexed keywords

ANODIC OXIDATION; AUGER ELECTRON SPECTROSCOPY; ELECTRIC CONDUCTIVITY OF SOLIDS; ELECTROCHEMISTRY; ETHANOL; MONOCHROMATORS; PHOTOLUMINESCENCE; PLASMA APPLICATIONS; SILICON WAFERS;

ELECTROCHEMICAL ANODIZATION; HYDROGEN PLASMA TREATMENT; OXYGEN PLASMA TREATMENT;

POROUS SILICON;

EID: 0031269275 PISSN: 00223093 EISSN: None Source Type: Journal
DOI: 10.1016/S0022-3093(97)00316-5 Document Type: Article

Times cited : (4)

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