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Volumn 144, Issue 11, 1997, Pages 4072-4076

Low specific contact resistivity titanium suicides on n+ and p+ silicon by sputter deposition of Ti/Si multilayers and annealing

(3) Revva, P a Kastanas, A a Nassiopoulou, A G a,b

a INSTITUTE OF MICROELECTRONICS (Greece)

b ELECTROCHEMICAL SOCIETY

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CMOS INTEGRATED CIRCUITS; ELECTRIC CONDUCTIVITY; MULTILAYERS; SEMICONDUCTING SILICON; SPUTTER DEPOSITION; TITANIUM; TITANIUM COMPOUNDS; X RAY DIFFRACTION;

SILICIDATION; TITANIUM SILICIDES;

INTEGRATED CIRCUIT MANUFACTURE;

EID: 0031269199 PISSN: 00134651 EISSN: None Source Type: Journal
DOI: 10.1149/1.1838138 Document Type: Article

Times cited : (3)

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