The role of N2 in aspect-ratio-dependent etching of SiO2

Journal of the Electrochemical Society

Volumn 144, Issue 11, 1997, Pages 3935-3939

  Buie, M J ^a,b   Joshi, A M ^a   Regis, J ^a  

^a APPLIED MATERIALS INC   (United States)

^b ELECTROCHEMICAL SOCIETY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; ELECTRON TRANSPORT PROPERTIES; EMISSION SPECTROSCOPY; FLUOROCARBONS; HYDROCARBONS; ION EXCHANGE; NITROGEN; POLYMERIZATION; REACTIVE ION ETCHING;

ASPECT RATIO DEPENDENT ETCHING; ION TRANSPORT; SURFACE CHARGING;

SILICA;

EID: 0031268214     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1838114     Document Type: Article

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