Removing dissolved oxygen from ultrapure water

Semiconductor International

Volumn 20, Issue 12, 1997, Pages 137-138

  Bujedo, Jesus ^a   Peterson, Paul A ^a  

^a NOKIA RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICALS REMOVAL (WATER TREATMENT); DEGASSING; OXYGEN; ULSI CIRCUITS; WATER QUALITY;

MEMBRANE CONTACTOR DEGASSING SYSTEMS;

INTEGRATED CIRCUIT MANUFACTURE;

EID: 0031259481     PISSN: 01633767     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (0)