Electrolytic treatment of continuous CVD silicon carbide fibers

Journal of the American Ceramic Society

Volumn 80, Issue 10, 1997, Pages 2754-2756

  Chang, Xinchun ^a   Du, Yijun ^b  

^a INSTITUTE OF METAL RESEARCH   (China)

^b CITY UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

CERAMIC FIBERS; CHEMICAL VAPOR DEPOSITION; CURRENT DENSITY; ELECTRIC CURRENTS; ELECTROCHEMISTRY; ETCHING; MORPHOLOGY; TENSILE STRENGTH;

FIBER RECEIVING RATE;

SILICON CARBIDE;

EID: 0031259138     PISSN: 00027820     EISSN: None     Source Type: Journal    
DOI: 10.1111/j.1151-2916.1997.tb03191.x     Document Type: Article

References (13)

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