Surface segregation and preferential sputtering in thin Al-Ni alloy films

Materials Chemistry and Physics

Volumn 50, Issue 3, 1997, Pages 209-212

  Stefanov, P ^a   Stanchev, A ^b  

^a INSTITUTE OF GENERAL AND INORGANIC CHEMISTRY   (Bulgaria)

^b INSTITUTE OF ELECTRONICS   (Bulgaria)

Author keywords

Alloys; Aluminium; Ion bombardment; Nickel; Oxidation; Segregation; X ray photoelectron spectroscopy

Indexed keywords

ANNEALING; ETCHING; ION BOMBARDMENT; OXIDATION; SEGREGATION (METALLOGRAPHY); SPUTTERING; SURFACE STRUCTURE; SURFACE TREATMENT; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

SURFACE SEGREGATION;

ALUMINUM ALLOYS;

EID: 0031258974     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0254-0584(97)01935-4     Document Type: Article

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