Growth and structure of electron beam evaporated V2O5 thin films

Materials Chemistry and Physics

Volumn 50, Issue 3, 1997, Pages 195-199

  Ramana, C V ^a   Hussain, O M ^a   Naidu, B Srinivasulu ^a  

^a SRI VENKATESWARA UNIVERSITY   (India)

Author keywords

Electrical conductivity; Growth; Structure; V2O5 thin films

Indexed keywords

ANNEALING; CRYSTAL STRUCTURE; DEPOSITION; ELECTRIC CONDUCTIVITY; ELECTRON BEAMS; EVAPORATION; OXYGEN; SEMICONDUCTOR GROWTH; THERMAL EFFECTS; THIN FILMS; VANADIUM COMPOUNDS;

ORTHORHOMBIC LAYERED STRUCTURE; VANADIUM PENTOXIDE;

SEMICONDUCTING FILMS;

EID: 0031258830     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0254-0584(97)01914-7     Document Type: Article

References (25)

1. I. Kosacki, M. Massot, M. Balkanski and H.L. Tuller, Mater. Sci. Eng. B, 12 (1992) 345.
2. D.W. Murphy, P.A. Christian, F.J. Disalvo and J.V. Waszczak, Inorg. Chem., 18 (1979) 2800.
3. S.F. Cogan, N.M. Nguyen, S.T. Perrotti and R.D. Rauph, Proc. Soc. Photo-Opt. Instrum. Eng., 57-62 (1988) 1016.
4. A. Talledo and C.G. Granqvist, J. Appl. Phys., 77 (1995) 4655.
5. H. Miyata, S. Tokuda and T. Yoshida, Appl. Spectrosc., 43 (1989) 522.
6. A. Legrouri, T. Baird and J.R. Fryer, J. Catal., 140 (1993) 173.
7. D.W. Murphy, P.A. Christian, F.J. Disalvo and J.N. Carides, J. Electrochem. Soc., 126 (1979) 497.
8. Y. Sota, T. Nomura, H. Tanaka and K. Kobayakawa, J. Electrochem. Soc., 138 (1991) 137.
9. C. Sanchez, J. Livage, J.P. Audiere and A. Madi, J. Non-Cryst. Solids, 65 (1984) 285.
10. G.A. Khan and C.A. Hogarth, J. Mater. Sci., 26 (1991) 1087.
11. C. Julien, J.P. Guesdon, A. Gorenstein, A. Khelfa and I. Ivanov, J. Mater. Sci. Lett., 14 (1995) 934.
12. D. Wruck, S. Ramamurthy and M. Rubin, Thin Solid Films, 182 (1991) 79.
13. M. Benmousa, E. Ibnouelghazi, A. Bennouna and E.L. Amezia, Thin Solid Films, 265 (1995) 22.
14. T. Szorenyi, K. Bali and I. Hevesi, J. Non-Cryst. Solids, 35-36 (1980) 1245.
15. M. Nabavi, C. Sanchez and J. Livage, Eur. J. Solid State Inorg. Chem., 25 (1991) 1173.
16. T. Yoshino, N. Baba and Y. Kouda, Jpn. J. Appl. Phys., 26 (1987) 782.
17. Y. Shimizu, K. Nagase, N. Miura andN. Yamazoe, Jpn. J. Appl. Phys., 29 (1990) L 1708.
18. J. Livage and R. Collongues, J. Mater. Sci. Eng., 23 (1976) 297.
19. ASTM Joint Commission on Powder Diffraction Standards, File No. 9-387, ASTM, Philadelphia, PA, 1974.
20. L. Abello, E. Husson, Y. Repelin and G. Lucazeau, Spectrochim. Acta A, 39 (1983) 641.
21. C.V. Ramana, O.M. Hussain, B.S. Naidu and P.J. Reddy in D.K. Chaturvedi and G.E. Murch (eds.), Disordered Materials - Current Developments, Trans. Tech. Publications, 1996, in Mater. Sci. Forum, 223-224 (1996) 449.
22. E. Culea, A.L. Nicula and I. Bratu, Phys. Status Solidi, 83 (1984) K 15.
23. T.R. Gilson, O.F. Bizri and N. Cheethman, J. Chem. Soc., Dalton Trans., 291 (1971).
24. I.R. Beattie and T.R. Gilson, J. Chem. Soc., A (1969) 2322.
25. C. Julien, J.P. Guesdon, A. Gorenstein, A. Khelfa and I. Ivanov, Appl. Surf. Sci., 90 (1995) 389.