A Mössbauer spectroscopy study of Ti-Fe interfaces produced by the PVD process

Thin Solid Films

Volumn 308-309, Issue 1-4, 1997, Pages 351-357

  Brooks, J S ^a   Davidson, J L ^a   Forder, S D ^a   Munz W D ^a   Larsson, M ^b  

^a SHEFFIELD HALLAM UNIVERSITY   (United Kingdom)

^b UPPSALA UNIVERSITY   (Sweden)

Author keywords

ABS ; CEMS; Ion etching

Indexed keywords

ADHESION; INTERFACES (MATERIALS); MOSSBAUER SPECTROSCOPY; PHASE TRANSITIONS; SPUTTER DEPOSITION; SUBSTRATES; SURFACE PROPERTIES; VAPOR DEPOSITION;

ARC BOND SPUTTERING (ABS) PROCESS; CONVERSION ELECTRON MOSSBAUER SPECTROSCOPY (CEMS); PHYSICAL VAPOR DEPOSITION (PVD);

PROTECTIVE COATINGS;

EID: 0031250228     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00574-9     Document Type: Article

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