Use of capacitance to measure surface forces. 2. Application to the study of contact mechanics

Langmuir

Volumn 13, Issue 22, 1997, Pages 5957-5961

  Frantz, Peter ^a,b   Artsyukhovich, Alexander ^a   Carpick, Robert W ^a,c   Salmeron, Miquel ^a  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b AEROSPACE CORPORATION   (United States)

^c UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; CAPACITANCE MEASUREMENT; HYSTERESIS; INTERFEROMETRY; SILICON; SUBSTRATES; SURFACE PHENOMENA; SURFACE PROPERTIES;

SHEAR FORCES;

MICA;

EID: 0031248881     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la9702650     Document Type: Article

References (37)

1. Israelachvili, J. N. In Fundamentals of Friction: Macroscopic and Microscopic Processes; Singer, I. L., Pollock, H. M., Eds.; Kluwer Academic Publishers: Dordrecht, 1992.
2. Savkoor, A. R. In Fundamentals of Friction: Macroscopic and Microscopic Processes; Singer, I. L., Pollock, H. M. Eds.; Kluwer Academic Publishers: 1992.
3. Bowden, F. P.; Tabor, D. The Friction and Lubrication of Solids; Clarendon Press: Oxford, 1950.
4. Lawn, B. R. Appl. Phys. Lett. 1985, 47, 809.
5. Israelachvili, J. N.; Berman, A. Isr. J. Chem. 1995, 35, 85.
6. Maugis, D. J. Colloid Interface Sci. 1991, 150, 243.
7. Johnson, K. L.; Kendall, K.; Roberts, A. D. Proc. R. Soc. London, Sect. A 1971, 324, 301.
8. Hough, D. B.; Ottewill, R. H. Prog. Colloid Polym. Sci. 1983, 68, 101.
9. Chaudhury, M. K.; Owen, M. J. J. Phys. Chem. 1993, 97, 5722.
10. Chaudhury, M. K. Mater. Sci., Eng. Rep. 1996, R16, 97.
11. Parker, J. L.; Claesson, P. M. Langmuir 1994, 10, 635.
12. Carpick, R. W.; Agrait, N.; Ogletree, D. F.; Salmeron, M. Submitted for publication.
13. Tabor, D. J. Colloid Interface Sci. 1977, 58, 2.
14. Tabor, D.; Winterton, R. H. Proc. R. Soc. London, Sect. A 1969, 312, 435.
15. Israelachvili, J. N. J. Colloid Interface Sci. 1973, 44, 259.
16. Horn, R. G.; Israelachvili, J. N.; Pribac, F. J. Colloid Interface Sci. 1987, 115, 480.
17. Christenson, H. K. J. Phys. Chem. 1993, 97, 12034.
18. Maugis, D.; Gauthier-Manuel, B, J. Adhes. Sci. Technol. 1994, 8, 1311.
19. Scmitt, F.-J.; Yoshizawa, H.; Schmidt, A.; Duda, G.; Knoll, W.; Wegner, G.; Israelachvili, J. N. Macromolecules 1995, 28, 3401.
20. Grunewald, T.; Helm, C. A. Langmuir 1996, 12, 3885.
21. Frantz, P.; Agrait, N.; Salmeron, M. Langmuir 1996, 12, 3289.
22. Johnson, K. L. Submitted to Proc. R. Soc. London, Sect. A.
23. Broekman, L.; Artsyukhovich, A.; Frantz, P.; Salmeron, M. To be submitted for publication.
24. Parker, J. L.; Christenson, H. K.; Ninham, B. W. Rev. Sci. Instrum. 1989, 60, 3135.
25. Tonck, A.; Georges, J. M.; Loubet, J. L. J. Colloid Interface Sci. 1988, 126, 150.
26. Fortney, L. R. Principles of Electromagnetics: Analog and Digital; Harcourt Brace Jovanovich Publishers: Orlando, FL, 1987.
27. Van Alsten, J.; Granick, S. Phys. Rev Lett. 1988, 6, 2570.
28. Boyer, C.; Houze, F.; Tonck, A.; Loubet, J.-C.; Georges, J. M. J. Phys. D 1994, 27, 1504.
29. Deryagin, B. V.; Metsik, M. S. Soviet Phys.-Solid State 1960, 1, 1393.
30. Israelachvili, J. N. J. Vac. Sci. Technol., A 1992, 10, 2901.
31. Hong, D. C.; Yue, S. Phys. Rev. Lett. 1995, 74, 254.
32. Wan, K.-T.; Smith, D. T.; Lawn, B. R. J. Am. Ceram. Soc. 1992, 75, 667.
33. McGuiggan, P. M; Israelachvili, J. N. J. Mater. Res. 1990, 5, 2232.
34. Gerlach, R.; Polanski, G.; Rubahn, H.-G. Surf. Sci. 1996, 352-354, 485.
35. Christenson, H. K. Langmuir 1996, 12, 1404.
36. Savkoor, A. R.; Briggs, G. A. D. Proc. R. Soc. London, Sect. A 1977, 356, 103.
37. Yoshizawa, H.; Chen, Y.-L.; Israelachvili, J. N. J. Phys. Chem. 1993, 97, 4128.