Magnetron sputter deposition and characterisation of Ti/Tin, Au/Tin and MoSxPb multilayers

Surface and Coatings Technology

Volumn 94-95, Issue , 1997, Pages 490-494

  Simmonds, M C ^a   Van Swygenhoven, H ^a   Pfluger E ^b   Savan, A ^b   Hauert, R ^c   Knoblauch, L ^c   Mikhailov, S ^d  

^a PAUL SCHERRER INSTITUTE   (Switzerland)

^b CSEM   (Switzerland)

^c EPMA   (Switzerland)

^d UNIVERSITY OF NEUCHÂTEL   (Switzerland)

Author keywords

Au Tin; Magnetron sputter deposition; MoSx Pb; Ti Tin

Indexed keywords

ATOMIC FORCE MICROSCOPY; FILM GROWTH; GOLD; LEAD; MAGNETRON SPUTTERING; MOLYBDENUM COMPOUNDS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SPUTTER DEPOSITION; TITANIUM; TITANIUM NITRIDE; WEAR OF MATERIALS; X RAY DIFFRACTION ANALYSIS;

AUGER DEPTH PROFILING; NANOINDENTATION TECHNIQUES; PIN ON DISC MEASUREMENTS;

MULTILAYERS;

EID: 0031248201     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(97)00431-3     Document Type: Article

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