X-ray stress measurement for TiN films evaporated by PVD

Thin Solid Films

Volumn 307, Issue 1-2, 1997, Pages 178-182

  Ejiri, Shouchi ^a   Sasaki, Toshihiko ^a   Hirose, Yukio ^a  

^a KANAZAWA UNIVERSITY   (Japan)

Author keywords

Preferred orientation; Residual stress; Thin films; Titanium nitride; X ray diffraction

Indexed keywords

CRYSTAL ORIENTATION; EVAPORATION; FUNCTIONS; MATHEMATICAL MODELS; RESIDUAL STRESSES; STRESS ANALYSIS; TEXTURES; THIN FILMS; VAPOR DEPOSITION; X RAY CRYSTALLOGRAPHY;

ORIENTATION DISTRIBUTION FUNCTION (ODF); PHYSICAL VAPOR DEPOSITION (PVD); REUSS MODEL; X RAY STRESS ANALYSIS;

TITANIUM NITRIDE;

EID: 0031247997     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00321-0     Document Type: Article

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