Mask misalignment in photolithographic fabrication of resonance-domain diffractive elements

Optics Communications

Volumn 142, Issue 1-3, 1997, Pages 14-18

  Kuittinen, Markku ^a   Turunen, Jari ^a  

^a UNIVERSITY OF EASTERN FINLAND   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROMAGNETIC WAVE DIFFRACTION; MASKS; PHOTOLITHOGRAPHY;

OPTICAL MULTIMASK LITHOGRAPHY;

DIFFRACTION GRATINGS;

EID: 0031247707     PISSN: 00304018     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0030-4018(97)00325-8     Document Type: Article

References (7)

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3. J. Turunen, in: Micro-optic: Elements, Systems, and Applications, Ed. H.P. Herzig (Taylor & Francis, London, 1997) ch. 2.
4. H. Dammann, Optik 31 (1970) 95.
5. J.W. Goodman, A.M. Silvestri, IBM J. Res. Dev. 14 (1970) 478.
6. E. Noponen, J. Turunen, A. Vasara, Appl. Optics 31 (1992) 5010.
7. M.T. Gale, in: Micro-optics: Elements, Systems, and Applications, Ed. H.P. Herzig (Taylor & Francis, London, 1997) ch. 6.