Volatile Cr contamination reduction in atmospheric pressure chemical vapor deposition systems by selective alloy oxidation

Journal of the Electrochemical Society

Volumn 144, Issue 10, 1997, Pages 3568-3571

  Bailey, Jeff ^a  

^a Watkins Johnson Company   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL REACTORS; CHEMICAL VAPOR DEPOSITION; CHROMIUM ALLOYS; CHROMIUM COMPOUNDS; CONTAMINATION; OXIDATION; SEMICONDUCTOR DEVICE MANUFACTURE; SILICON WAFERS;

CHROMIA;

NICKEL ALLOYS;

EID: 0031247416     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1838049     Document Type: Article

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