Cu (111) electron band structure and channeling by VLEED

Physica Status Solidi (A) Applied Research

Volumn 163, Issue 2, 1997, Pages 455-464

  Bartos I ^a   Barbieri, A ^b   Van Hove, M A ^b   Chung, W F ^c   Cai, Q ^c   Altman, M S ^c  

^a INSTITUTE OF PHYSICS   (Czech Republic)

^b UNIVERSITY OF CALIFORNIA   (United States)

^c HONG KONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; CRYSTAL ORIENTATION; CURRENT VOLTAGE CHARACTERISTICS; ELECTRON MICROSCOPY; ENERGY GAP; LOW ENERGY ELECTRON DIFFRACTION; SURFACE PHENOMENA; SURFACE STRUCTURE;

ELECTRON ATTENUATION; ELECTRON CHANNELING; VERY LOW ENERGY ELECTRON DIFFRACTION (VLEED);

COPPER;

EID: 0031247329     PISSN: 00318965     EISSN: None     Source Type: Journal    
DOI: 10.1002/1521-396X(199710)163:2<455::AID-PSSA455>3.0.CO;2-M     Document Type: Article

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