Fabrication and properties of one-mask-patterned ferroelectric integrated capacitors

Electrical Engineering in Japan (English translation of Denki Gakkai Ronbunshi)

Volumn 121, Issue 1, 1997, Pages 43-50

  Torii, Kazuyoshi ^a   Shoji, Kenichi ^a   Kawakami, Hiroshi ^a   Kumihashi, Takao ^a   Itoga, Toshihiko ^a   Yokoyama, Natsuki ^a   Moniwa, Masahiro ^a   Kaga, Tooru ^a   Fujisaki, Yoshihisa ^a  

^a HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT DENSITY; DRY ETCHING; ELECTRIC CHARGE; FERROELECTRIC DEVICES; LEAKAGE CURRENTS; MASKS; RANDOM ACCESS STORAGE; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICE STRUCTURES; SEMICONDUCTOR DEVICE TESTING;

ONE MASK PATTERNED FERROELECTRIC INTEGRATED CAPACITORS;

CAPACITORS;

EID: 0031246061     PISSN: 04247760     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1520-6416(199710)121:1<43::AID-EEJ6>3.0.CO;2-#     Document Type: Article

References (10)