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Volumn 6, Issue 5, 1997, Pages 633-639

Surface application of metal silicides for improved electrical properties of field-emitter arrays

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CHROMIUM COMPOUNDS; ELECTRIC CONDUCTIVITY; ETCHING; HARDNESS; MATHEMATICAL MODELS; MORPHOLOGY; SEMICONDUCTING SILICON; SURFACES; THERMAL EFFECTS; TITANIUM COMPOUNDS;

EID: 0031245283     PISSN: 09641726     EISSN: None     Source Type: Journal    
DOI: 10.1088/0964-1726/6/5/016     Document Type: Article
Times cited : (10)

References (10)
  • 1
    • 0028466179 scopus 로고
    • Vacuum microelectronic devices
    • Brodie I and Schwoebel P R 1994 Vacuum microelectronic devices Proc. IEEE 82 98-126
    • (1994) Proc. IEEE , vol.82 , pp. 98-126
    • Brodie, I.1    Schwoebel, P.R.2
  • 3
    • 0000593179 scopus 로고
    • Chemical vapor deposition and plasma-enhanced chemical vapor deposition carbonization of silicon microtips
    • Zhirnov V V and Givargizov E I 1994 Chemical vapor deposition and plasma-enhanced chemical vapor deposition carbonization of silicon microtips J. Vac. Sci. Technol. B 12 633-7
    • (1994) J. Vac. Sci. Technol. B , vol.12 , pp. 633-637
    • Zhirnov, V.V.1    Givargizov, E.I.2
  • 4
    • 0042857222 scopus 로고
    • Modification of Si field emitter surface by chemical conversion to SiC
    • Liu J. Son U T et al 1994 Modification of Si field emitter surface by chemical conversion to SiC J. Vac. Sci. Technol. B 12 717-21
    • (1994) J. Vac. Sci. Technol. B , vol.12 , pp. 717-721
    • Liu, J.1    Son, U.T.2
  • 6
    • 0019038920 scopus 로고
    • Refractory silicides for integrated circuit
    • Murarka S P 1980 Refractory silicides for integrated circuit J. Vac. Sci. Technol. 17 775-92
    • (1980) J. Vac. Sci. Technol. , vol.17 , pp. 775-792
    • Murarka, S.P.1
  • 10
    • 0001717095 scopus 로고
    • Simulation of fabricated field emitter structures
    • Hong D and Aslam M 1994 Simulation of fabricated field emitter structures J. Vac. Sci. Technol. B 12 764-9
    • (1994) J. Vac. Sci. Technol. B , vol.12 , pp. 764-769
    • Hong, D.1    Aslam, M.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.