Hydrodynamic and Chemical Modeling of a Chemical Vapor Deposition Reactor for Zirconia Deposition

Journal de Physique III

Volumn 7, Issue 9, 1997, Pages 1779-1796

  Belmonte, T ^a   Gavillet, J ^a   Czerwiec, T ^a   Ablitzer, D ^a   Michel, H ^a  

^a INSTITUT JEAN LAMOUR   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; CHEMICAL REACTORS; CHEMICAL VAPOR DEPOSITION; CYLINDERS (SHAPES); HYDRODYNAMICS; HYDROLYSIS; MATHEMATICAL MODELS; MIXING; PLASMA APPLICATIONS; SUBSTRATES;

CHEMICAL VAPOR DEPOSITION REACTOR; RATE CONSTANTS; REACTION CROSS SECTIONS; TWO DIMENSIONAL;

ZIRCONIA;

EID: 0031232523     PISSN: 11554320     EISSN: None     Source Type: Journal    
DOI: 10.1051/jp3:1997222     Document Type: Article

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