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Volumn 36, Issue 9 SUPPL. B, 1997, Pages 5917-5920
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Atomic force microscopy observation of the initial growth stage and the ferroelectric properties of Bi2VO5.5 films on SrTiO3(100), Si(100) substrates
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Author keywords
AFM; Bi2VO5.5; Ferroelectric thin film; FRAM
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Indexed keywords
ATOMIC FORCE MICROSCOPY;
BISMUTH COMPOUNDS;
CAPACITORS;
CRYSTAL ORIENTATION;
DEPOSITION;
FILM GROWTH;
LASER ABLATION;
NUCLEATION;
PERMITTIVITY;
RANDOM ACCESS STORAGE;
STRONTIUM COMPOUNDS;
ULTRATHIN FILMS;
BISMUTH VANADATE;
FERROELECTRIC RANDOM ACCESS MEMORY (FRAM);
STRONTIUM TITANATE;
FERROELECTRIC MATERIALS;
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EID: 0031223597
PISSN: 00214922
EISSN: None
Source Type: Journal
DOI: 10.1143/jjap.36.5917 Document Type: Article |
Times cited : (7)
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References (14)
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