Polysilicon cantilever beam using surface micromachining technology for application in microswitches

Journal of Micromechanics and Microengineering

Volumn 7, Issue 3, 1997, Pages 159-161

  Lucas, S ^a   Kis Sion, K ^a   Pinel, J ^a   Bonnaud, O ^a  

^a CNRS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

MICROELECTROMECHANICAL DEVICES; MICROMACHINING; SEMICONDUCTOR SWITCHES; STICTION; STRESS CONCENTRATION;

POLYSILICON CANTILEVER BEAMS;

PHASE SHIFTERS;

EID: 0031223152     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/7/3/021     Document Type: Article

References (2)

1. Harbeke G, Krausbauer L, Steigmeier E F, Widmer A E, Kappert H F and Neugebauer G 1984 Growth and physical properties of LPCVD polycrystalline silicon films J. Electrochem. Soc. 131 675-82
2. Ristic L (ed) 1994 Sensor Technology and Devices (Dedham, NA: Artech House)