The hydrophilization of process wafers in dilute hydrogen peroxide solutions and ozonated deionized water and its effects on defects and gate oxide integrity

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 9 A, 1997, Pages 5416-5420

  Park, Jin Goo ^a  

^a Hanyang University   (South Korea)

Author keywords

Breakdown field strength; Defects; Dilute H2O2 solutions; HF last wet cleaning; Ozonated DI water; Water marks

Indexed keywords

CRYSTAL DEFECTS; ELECTRIC BREAKDOWN OF SOLIDS; GATES (TRANSISTOR); HYDROFLUORIC ACID; HYDROGEN PEROXIDE; MOSFET DEVICES; SURFACE CLEANING;

BREAKDOWN FIELD STRENGTH; OZONATED DEIONIZED WATER; WATER MARKS;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0031222777     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.5416     Document Type: Article

References (14)

1. W. Kern and D. A. Puotinen: RCA Rev. 31 (1970) 187.
2. J.-G. Park and S. Raghavan: J. Adhesion Sci. Tech. 7 (1993) 179.
3. V. A. Burrows, Y. J. Chabal, G. S. Higashi, K. Raghavachari and S. B. Christman: Appl. Phys. Lett. 53 (1988) 998.
4. V. B. Menon, L. D. Michaels, A. C. Clayton and R. P. Donovan: Solid State Technol. 32 (1989) S9.
5. M. Watanabe, M. Hamano and M. Harazono: Mater. Sci. Eng. B 4 (1989) 401.
6. J.-G. Park and M. Pas: J. Electrochem. Soc. 142 (1995) 2028.
7. T. Roche, S. Adler, R. Cosway, S. Schauer and L. Liu: Proc. Fourth Int. Symp. Cleaning Technology in Semiconductor Device Manufacturing 95-20, eds. J. Ruzyllo and R. E. Novak (Electrochemical Society, 1996) p. 300.
8. K. Fujino, Y. Nishimoto, N. Tokumasu and K. Maeda: J. Electrochem. Soc. 137 (1990) 2883.
9. J. R. Vig: Handbook of Semiconductor Wafer Cleaning Technology, ed. W. Kern (Noyes Publications, New Jersey, 1993) Chap. 6.
10. T. Ohmi, T. Isagawa, M. Kogure and T. Imaoka: J. Electrochem. Soc. 140 (1993) 804.
11. F. Tardif, T. Lardin, C. Paillet, J. P. Joly, A. Fleury, P. Patruno, D. Levy and K. Barla: Proc. Fourth Int. Symp. Cleaning Technology in Semiconductor Device Manufacturing 95-20, eds. J. Ruzyllo and R. E. Novak (Electrochemical Society, 1996) p. 49.
12. F. A. Cotton and G. Wilkinson: Advanced Inorganic Chemistry (John Wiley & Sons, New York, 1988) 5th ed.
13. M. Meuris, H. Izumi, K. Kubo, S. Ojima, T. Ohmi and M. M. Heyns: Proc. Fourth Int. Symp. Cleaning Technology in Semiconductor Device Manufacturing 95-20, eds. J. Ruzyllo and R. E. Novak (Electrochemical Society, 1996) p. 444.
14. C. Pailet, J. P. Joly and F. Tardif, K. Barla, P. Patruno and D. Levy: Proc. Fourth Int. Symp. Cleaning Technology in Semiconductor Device Manufacturing, 95-20, eds. J. Ruzyllo and R. E. Novak (Electrochemical Society, 1996) p. 366.