Precision side-polished fibers with a long interaction length

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 36, Issue 9 A/B, 1997, Pages

  Liaw, Shien Kuei ^a,d   Chiu, Jin Yu ^b   Tseng, Shiao Min ^c  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^b Siemens Telecommunication ^*  (Taiwan)

^c NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^d CHUNGHWA TELECOM CO LTD   (Taiwan)

Author keywords

Long interaction length; Negligible loss; Side polished

Indexed keywords

POLISHING; SEMICONDUCTING SILICON;

INTERACTION LENGTHS;

OPTICAL FIBERS;

EID: 0031222625     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.l1179     Document Type: Article

References (10)

1. A. Knoesen, S. A. Hamilton, D. R. Yankelevich, R. A. Hill, R. T. Weverka and G. C. Bjorklund: Proc. LEOS'96, USA (IEEE/LEOS, Boston, 1996) p. 81.
2. K. Y. Hsu, S. P. Ma, K. F. Chen, S. M. Tseng and J. I. Chen: Jpn. J. Appl. Phys. 36 (1997) L488.
3. S. M. Tseng, K. Y. Hsu, H. S. Wei and K. F. Chen: IEEE Photonics Technol. Lett. 9 (1997) 628.
4. R. P. Dahlgren and N. H. Katis: IEEE Photonics Technol. Lett. 5 (1993) 1227.
5. M. Digonnet and H. J. Shaw: Appl. Opt. 22 (1983) 484.
6. S. M. Tseng and C. L. Chen: Appl. Opt. 31 (1992) 3438.
7. O. G. Leminger and R. Zengerle: J. Lightwave Technol. LT-3 (1985) 864.
8. J. M. Bennett, J. Jahanmir, J. C. Podlesny, T. L. Balter and D. H. Hobbs: Appl. Opt. 34 (1995) 213.
9. P. K. Tien: Appl. Opt. 10 (1971) 2395.
10. J. Y. Chiu, S. K. Liaw and S. M. Tseng: Proc. LEOS'93, USA (IEEE/LEOS, San Jose, 1993) p. 175.