Cleaning of contacts for electronic components

Vacuum

Volumn 48, Issue 7-9, 1997, Pages 779-783

  Koller, L ^a   Bizjak, M ^b   Pozun K ^a   Leskovsek J ^a   Vrhovec, S ^a  

^a Inst Electronics Vacuum Techniques   (Slovenia)

^b IskraTEL Electronics   (Slovenia)

Author keywords

[No Author keywords available]

Indexed keywords

CLEANING; DEGASSING; ELECTRIC RESISTANCE; FORCE MEASUREMENT; MECHANICAL PROPERTIES; PLASMA APPLICATIONS; SILVER ALLOYS; VACUUM APPLICATIONS;

VACUUM OUTGASSING;

ELECTRIC CONTACTS;

EID: 0031221805     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0042-207x(97)00044-4     Document Type: Article

References (11)

1. R Holm, Electric Contacts Handbook. Springer, New York (1967).
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3. VDE - Fachbericht 47, 13. Kontaktseminar, Karlsruhe, 4-6 Okt. (1995).
4. Doduco Datenbuch, 2, Auflage, Pforzheim (1977).
5. Koller, L., Zavašnik, R. and Jenko, M., Vacuum, 1992, 43, 741.
6. Koller, L., Jenko, M., Spruk, S., Praček, B. and Vrhovec, S., Vacuum, 1995, 46, 827.
7. M Wutz, H Adam and W Walcher, Theory and Practice of Vacuum Technology. Friedr. Vieweg and Sohn, Braunschweig (1989).
8. Banovec, A., DVTS - Bilten, 1979, 17, 273.
9. D F Bazzare and F W Engle, Plasma Processing: Cleaning, Etching and Deposition for Electronic Applications. Tech. Report "Technics", Virginia, U.S.A. (1996).
10. H Suhr, Application of Nonequilibrium Plasmas to Organic Chemistry Techniques and Applications of Plasma Chemistry, Wiley, New York (1974) Chap 2, p 57.
11. A Jacob, The Versatile Technique of RF - Plasma Etching, Part I. The Etch Profile, Solid State Technology (1976) p 70.