Irradiation of silicon with a pulsed plasma beam containing Mo ions

Surface and Coatings Technology

Volumn 93, Issue 2-3, 1997, Pages 258-260

  Piekoszewski, J ^a   Werner, Z ^a   Langner, J ^a   Janik Czachor, M ^b  

^a SOLTAN INSTITUTE FOR NUCLEAR STUDIES   (Poland)

^b INSTITUTE OF PHYSICAL CHEMISTRY   (Poland)

Author keywords

Mo Si layers; Plasma pulses; Plasma beam mixing

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; BEAM PLASMA INTERACTIONS; MOLYBDENUM; NITROGEN; PLASMAS; PROTONS; SEMICONDUCTING SILICON; SURFACE TENSION;

PLASMA BEAM MIXING;

ION IMPLANTATION;

EID: 0031221446     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(97)00056-X     Document Type: Article

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