Theory and experiments on r.f. sputtered tin oxide thin-films for gas sensing applications

Sensors and Actuators, B: Chemical

Volumn 43, Issue 1-3, 1997, Pages 161-164

  Tang, Zhenan ^a   Jiang, Guoping ^a   Chan, Philip C H ^b   Sin, Johnny K O ^b   Lau, Silvanus S ^c  

^a DALIAN UNIVERSITY OF TECHNOLOGY   (China)

^b HONG KONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Hong Kong)

^c UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Gas; Thin films; Tin oxide

Indexed keywords

CHEMICAL ANALYSIS; COMPOSITION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SPUTTERING; THIN FILM DEVICES; TIN COMPOUNDS;

GAS SENSING PROPERTIES; RADIO FREQUENCY SPUTTERING; TIN DIOXIDE;

CHEMICAL SENSORS;

EID: 0031221038     PISSN: 09254005     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-4005(97)00204-9     Document Type: Article

References (7)

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