An X-ray stress measurement method for very small areas on single crystals

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 9 A, 1997, Pages 5764-5769

  Yoshiike, Takahisa ^a   Fujii, Nobuyuki ^b   Kozaki, Shigeru ^b  

^a Hamamatsu Polytechnic College   (Japan)

^b POLYTECHNIC UNIVERSITY   (Japan)

Author keywords

Imaging plate; Silicon; Single crystal; Small areas; X ray stress measurement

Indexed keywords

MECHANICAL VARIABLES MEASUREMENT; SILICON; X RAY CRYSTALLOGRAPHY; X RAY POWDER DIFFRACTION;

IMAGING PLATES; X RAY STRESS MEASUREMENT METHOD;

SINGLE CRYSTALS;

EID: 0031220602     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.5764     Document Type: Article

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