Monte Carlo simulation of argon atoms transport during deposition of W thin films by RF-dc coupled magnetron sputtering

Vacuum

Volumn 48, Issue 7-9, 1997, Pages 669-670

  Petrov, P K ^a   Volpyas, V A ^a   Hollmann, E K ^a   Tanaka, T ^b   Kawabata, K ^b  

^a SAINT PETERSBURG ELECTROTECHNICAL UNIVERSITY LETI   (Russian Federation)

^b HIROSHIMA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; ARGON; COMPUTER SIMULATION; MAGNETRON SPUTTERING; MONTE CARLO METHODS; SUBSTRATES; THIN FILMS;

ION PLASMA SPUTTERING;

METALLIC FILMS;

EID: 0031219809     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0042-207x(97)00079-1     Document Type: Article

References (8)

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