Quantitative Auger electron spectroscopy in thin film depth profiling

Vacuum

Volumn 48, Issue 7-9, 1997, Pages 607-612

  Hofmann, Siegfried ^a,b  

^a MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS   (Germany)

^b NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; DIFFUSION IN SOLIDS; MATHEMATICAL MODELS; SPUTTERING; SURFACE PROPERTIES; SURFACE ROUGHNESS; THIN FILMS;

DEPTH PROFILING;

INTERFACES (MATERIALS);

EID: 0031219808     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0042-207x(97)00046-8     Document Type: Article

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