Photopolymerization of acrylate films under an imposed spatial irradiation: Thermodynamics of relief self-development

Journal of Colloid and Interface Science

Volumn 192, Issue 1, 1997, Pages 149-155

  Lavielle, L ^a   Croutxe Barghorn C ^a   Schuller, E ^a   Lougnot, D J ^a  

^a Ecole Nationale Superieure de Chimie de Mulhouse   (France)

Author keywords

Acrylate; Photopolymer; Relief; Self development; Surface thermodynamics

Indexed keywords

POLYACRYLIC ACID;

ARTICLE; CHEMICAL REACTION; PHOTOCHEMISTRY; PRIORITY JOURNAL; THERMODYNAMICS;

EID: 0031214534     PISSN: 00219797     EISSN: None     Source Type: Journal    
DOI: 10.1006/jcis.1997.4972     Document Type: Article

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