Channel spark discharges for thin film technology

IEEE Transactions on Plasma Science

Volumn 25, Issue 4, 1997, Pages 758-762

  Witke, Thomas ^a   Lenk, Andreas ^a   Siemroth, Peter ^a  

^a FRAUNHOFER INSTITUTE FOR MATERIAL AND BEAM TECHNOLOGY IWS   (Germany)

Author keywords

Channel spark; Electron beam; Evaporation; High speed observation; Optical spectroscopy; Plasma production; Thin film deposition

Indexed keywords

EMISSION SPECTROSCOPY; EVAPORATION; IONIZATION OF SOLIDS; LASER ABLATION; LASER PULSES; PLASMA APPLICATIONS; SPUTTER DEPOSITION; THIN FILMS;

CHANNEL SPARK DISCHARGES;

ELECTRIC SPARKS;

EID: 0031212731     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/27.640700     Document Type: Article

References (6)

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