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Volumn 242, Issue 1-2, 1997, Pages 161-165

Deep level defects in n- and p-type Fe implanted InP

Author keywords

Deep levels; Defects; Indium phosphide; Semiconductor

Indexed keywords

ACTIVATION ENERGY; CAPACITANCE; CRYSTAL DEFECTS; DEEP LEVEL TRANSIENT SPECTROSCOPY; ELECTROSTATICS; ION IMPLANTATION; IRON; SEMICONDUCTOR DOPING; TIN; TRANSIENTS;

EID: 0031212497     PISSN: 03784371     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0378-4371(97)00201-X     Document Type: Article
Times cited : (2)

References (14)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.