Study of the photosensitivity at 193 nm and comparison with photosensitivity at 240 nm influence of fiber tension: Type IIa aging

Journal of Lightwave Technology

Volumn 15, Issue 8, 1997, Pages 1464-1469

  Riant, Isabelle ^a,b,c,d,e   Haller, Fabrice ^a,e,f  

^a NOKIA RESEARCH CENTER   (United States)

^b Ecole Superieure d'Optique   (France)

^c UNIVERSITÉ PARIS SACLAY   (France)

^d UNIVERSITY OF MARYLAND   (United States)

^e Alcatel Alsthom Recherche   (France)

^f UNIV LILLE   (France)

Author keywords

Aging; Gratings; Optical fibers; Photorefractive materials; Strain

Indexed keywords

AGING OF MATERIALS; DIFFRACTION GRATINGS; MULTIPHOTON PROCESSES; PHOTOSENSITIVITY; REFRACTIVE INDEX; STRAIN; STRESSES;

GERMANOSILICATE FIBERS;

OPTICAL FIBERS;

EID: 0031212483     PISSN: 07338724     EISSN: None     Source Type: Journal    
DOI: 10.1109/50.618378     Document Type: Article

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