Effect of ultraviolet irradiation on silicon oxide films prepared by radio frequency plasma-enhanced chemical vapor deposition

Journal of the Electrochemical Society

Volumn 144, Issue 8, 1997, Pages 2824-2828

  Hozumi, Atsushi ^a,b   Sekoguchi, Hiroki ^a   Takai, Osamu ^a  

^a NAGOYA UNIVERSITY   (Japan)

^b ELECTROCHEMICAL SOCIETY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; COMPOSITION EFFECTS; FILM PREPARATION; HARDNESS; OXIDES; PLASMA APPLICATIONS; SILANES; SUBSTRATES; ULTRAVIOLET RADIATION;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD); SILICON OXIDE FILMS;

SEMICONDUCTING FILMS;

EID: 0031211595     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1837901     Document Type: Article

References (25)

1. R. Reif and W. Kern, Thin Film Processes II, J. L. Vossen and W. Kern, Editors, p. 525, Academic Press, San Diego, CA (1991).
2. A. Sherman, in Handbook of Deposition Technologies for Films and Coatings, 2nd ed., R. F. Bunshah, Editor, p. 434, Noyes Publication, Park Ridge, NJ (1994).
3. O. Takai and E. Hori, Proc. Jpn. Symp. Plasma Chem., 2, 191 (1989).
4. O. Takai and T. Kawahara, ibid., 3, 45 (1990).
5. O. Takai and T. Kawahara, S. Hayakawa, and N. Yamazaki, ibid., 4, 203 (1991).
6. O. Takai and T. Kawahara, and S. Hayakawa, ibid., 5, 39 (1990).
7. O. Takai and T. Honjo, Proc. Symp. Plasma Sci. Mater., 6, 163 (1993).
8. T. Honjo and O. Takai, ibid., 7, 153 (1994).
9. K. Inoue, M. Michimori, M. Okuyama, and Y. Hamakawa, Jpn. J. Appl. Phys., 26, 805 (1987).
10. P. Gonzalez, D. Fernandez, J. Pou, E. Garcia, J. Serra, B. Leon, and M. Perez-Amor, Thin Solid Films, 218, 170 (1992).
11. J. Marks and R. E. Robertson, Appl. Phys. Lett., 52, 810 (1988).
12. Y. Toyoda, K. Inoue, M. Okuyama, and Y. Hamakawa, Jpn. J. Appl. Phys., 26, 835 (1987).
13. M. Niwano, S. Hirano, M. Suemitsu, K. Honma, and N. Miyamoto, ibid., 28, 1310 (1989).
14. M. Niwano, K. Kinashi, K. Saito, N. Miyamoto, and K. Honma, This Journal, 141, 1556 (1994).
15. A. Hozumi, N. Sugimoto, H. Sekoguchi, and O. Takai, J. Mater. Sci. Lett., 16, 860 (1997).
16. H. Sekoguchi, A. Hozumi, N. Kakinoki, and O. Takai, in Proceedings of the 2nd Korea-Japan Symposium on Plasma and Thin Film Technology, Oct. 1996.
17. G. Socrates, Infrared Characteristic Group Frequencies: Tables and Charts, 2nd ed., p. 157, John Wiley & Sons, Inc., Chichester, England (1994).
18. E. Ritter, Opt. Acta., 9, 197 (1962).
19. W. R. Knolle, H. R. Maxwell, Jr., and R. E. Benenson, J. Appl. Phys., 51, 4385 (1980).
20. Y. Mishima, M. Hirose, Y. Osaka, and Y. Ashida, ibid., 55, 1234 (1984).
21. P. G. Pai, S.S. Chao, Y. Takagi, and G. Lucovsky, J. Vac. Sci. Technol., A4, 689 (1986).
22. J. G. Calvert and J. N. Pitts, Jr., Photochemistry, p. 207, John Wiley & Sons, Inc., New York (1967).
23. H. Okabe, Photochemistry of Small Molecules, 1st ed., p. 177, John Wiley & Sons, Inc., New York (1978).
24. S. T. Amimoto, A. P. Force, R. G. Gulotty, Jr., and J. R. Wiesenfeld, J. Chem. Phys., 71, 3640 (1979).
25. Y. Ishikawa, H. Yoshima, and Y. Hirose, J. Surf. Finish Soc. Jpn., 47, 74 (1996).