Removal of oxygen from the Si(100) surface in a DC hydrogen plasma

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 8, 1997, Pages 5068-5071

  Kroon, Ron ^a  

^a PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

DC hydrogen plasma; Oxygen; Silicon; Surface

Indexed keywords

HYDROGEN PLASMA ETCHING; REACTION CHAMBER;

GLOW DISCHARGES; HYDROGEN; ION BOMBARDMENT; OXIDATION; OXYGEN; PLASMA ETCHING; REDUCTION; SURFACE TREATMENT; VACUUM APPLICATIONS;

SEMICONDUCTING SILICON;

EID: 0031211566     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.5068     Document Type: Article

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