A photoelectron diffraction study of the structure of ultrathin iron films on Cu{110}

Surface Science

Volumn 385, Issue 1, 1997, Pages 107-114

  Theobald, A ^a   Bao, S ^a   Fernandez, V ^a   Schindler, K M ^a   Schaff, O ^a   Fritzsche, V ^a   Bradshaw, A M ^a   Booth, N ^b   Woodruff, D P ^b  

^a FRITZ HABER INSTITUT DER MAX PLANCK GESELLSCHAFT   (Germany)

^b UNIVERSITY OF WARWICK   (United Kingdom)

Author keywords

Copper; Growth; Iron; Metal metal interfaces; Photoelectron diffraction

Indexed keywords

COPPER; CRYSTAL ORIENTATION; ELECTRON DIFFRACTION; FILM GROWTH; INTERFACES (MATERIALS); IRON; MONOLAYERS; ULTRATHIN FILMS;

MONOLAYER EQUIVALENTS (MLE); PHOTOELECTRON DIFFRACTION;

SURFACE STRUCTURE;

EID: 0031210932     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(97)00212-4     Document Type: Article

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